ACCU Gas–Liquid Mixed Evaporation System

2026-06-18

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In high-end industrial and research applications—such as sensor calibration, fuel cell development, automotive component reliability testing, semiconductor CVD deposition, and photovoltaic cell fabrication—the stable evaporation‑and‑mixing of process media is of critical importance. To meet diverse operating conditions, stringent precision requirements, and wide-ranging vaporization needs, customized, dedicated evaporation‑and‑mixing systems are increasingly becoming indispensable core equipment in advanced manufacturing processes.
In many industrial manufacturing processes, foam‑generation systems are commonly relied upon when it is necessary to blend two or more components. However, this conventional approach has significant limitations: first, it struggles to handle low‑vapor‑pressure liquids, with limited vaporization capacity that fails to meet the material‑transport requirements of certain processes; second, the system cannot dynamically adjust in real time to fluctuations in steam pressure, resulting in crude control of the gas–liquid mixing ratio. The direct consequence is deteriorating process consistency—issues such as uneven CVD film deposition thickness, scattered sensor‑calibration data, and poor reproducibility in fuel‑cell simulation experiments frequently arise, severely hindering improvements in R&D efficiency and production yield.


ACCU’s innovatively developed ACU20CEM gas–liquid mixing and evaporation system has successfully overcome these technical bottlenecks. Leveraging advanced control technologies, the system delivers rapid response, precise regulation, and highly efficient evaporation, significantly enhancing the accuracy of the mixing process and providing a stable, reliable process solution for demanding industrial applications.


The ACU20CEM hybrid evaporation system boasts key advantages: it is equipped with high‑precision mass flow controllers, ensuring stable, drift‑free gas–liquid molar ratios over long‑term operation for liquid flow, carrier gas flow, and evaporation temperature. With a maximum vaporization rate of 1,200 g/h, the system seamlessly accommodates both laboratory‑scale trace experiments and pilot‑scale production at high flow rates, offering a wide measurement range to meet diverse application needs. Moreover, its exceptional steam‑output uniformity effectively eliminates localized concentration gradients, laying a solid foundation for processes such as CVD that demand extremely consistent precursor distribution.
Application scenarios span the entire industry chain: The ACU20CEM hybrid evaporation system has achieved mature, widespread deployment across multiple sectors and use cases. In core processes of semiconductor and photovoltaic manufacturing, the system robustly supports critical steps such as conductive‑layer and insulating‑layer deposition, vacuum processes, and chemical vapor deposition (CVD). On the research side, it underpins fuel‑cell media simulations, high‑precision sensor calibration, and chemical analysis in the pharmaceutical and food industries. In industrial applications, it meets stringent testing requirements for automotive component environmental aging and performance calibration.


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