In the semiconductor, hydrogen energy, and high-end manufacturing sectors, pressure control is the “heart” of fluid systems—its precision, response speed, and stability directly determine production efficiency, product yield, and even the accuracy of experimental data. The ACCU series pressure controllers, built around piezoelectric diaphragm sensing and digital circuitry, ensure high‑precision pressure measurement and control, along with long‑term stability and reliability. With simple installation and rapid commissioning, they are the ideal choice for a wide range of gas‑line pressure‑regulation applications in both laboratory R&D and industrial mass production.

The ACCU series pressure controllers are specifically designed for closed-loop regulation of gas and liquid pressures. They continuously acquire pipeline pressure signals and rapidly drive the built-in regulating valve to actively compensate for pressure deviations caused by upstream pressure fluctuations, downstream flow disturbances, and other factors. These products exhibit exceptional resistance to pressure variations, maintaining long-term stability even in complex pneumatic systems. The ACU10P features an integrated dynamic proportional valve that achieves stepless pressure control through continuous adjustment of the valve opening. The ACU20P represents an enhanced‑performance model with higher accuracy and broader applicability across a wider range of operating conditions; it can be equipped with either an integral or split‑type control valve and supports multiple control modes, including upstream pressure control, backpressure control, and pressure regulation in sealed vessels, enabling flexible adaptation to diverse process requirements.

The ACCU series pressure controllers offer measurement and control of absolute pressure, gauge pressure (100 kPa to 10 MPa), and differential pressure, with high accuracy and excellent repeatability, ensuring reliable and consistent control results every time. Their straight‑through design minimizes pressure loss and dead volume in the piping, making them equally suitable for high‑purity gases and corrosive media. With a leak rate as low as 1 × 10⁻⁹ Pa·m³/s, the ACCU series significantly limits unwanted gas mixing, thereby meeting the stringent purity requirements of semiconductor‑related process equipment such as MOCVD and ALD systems.

In terms of communication, in addition to the standard Modbus protocol, the device also supports Profibus, DeviceNet, and other protocols, and provides analog I/O signals. By adjusting setpoints, it enables precise control of the entire process. The product offers a wide range of customizable measurement ranges and interface options, catering to corrosive gases and special operating conditions, and meeting diverse application needs from R&D through to mass production.

Typical application scenarios:

Hydrogen energy sector: In water electrolysis hydrogen‑production tests, it enables precise back‑pressure control; in fuel‑cell test systems, it provides rapid response to test pressures and achieves the set target within a specified time, ensuring stable operation of hydrogen‑energy research and testing.

Leakage and Hermeticity Testing: Providing leak testing and hermeticity inspection for precision components in high-end manufacturing, supporting both positive‑pressure and negative‑pressure tests to ensure that component sealing performance meets stringent standards.

CVD vacuum coating: In fields such as vacuum coating and synthetic diamond growth, the consistency of pressure control during atomic layer deposition and chemical vapor deposition directly impacts yield; pressure controllers enable highly stable and precise pressure regulation.

MOCVD system: Precisely captures precursor and carrier gas pressures, enabling highly repeatable, rapid closed-loop control of critical process variables; its low-leakage design effectively prevents unintended gas mixing, thereby enhancing operational efficiency.

Semiconductor manufacturing: In processes such as wafer etching and thin-film deposition, precise control of chamber pressure is achieved to ensure the accuracy and consistency of chip fabrication.

Fine Chemicals: In reactor pressure control and fluid‑transfer regulation, stabilizing pressure parameters enhances the controllability of chemical reactions and improves product purity.

Scientific research experiment: In laboratory fluid dynamics testing and materials‑property studies, high‑precision pressure and flow control is provided to ensure the reliability of experimental data.

High-end equipment manufacturing: In the hydraulic and pneumatic systems of automated production lines, dynamic pressure regulation is implemented to enhance equipment operational stability and efficiency.

In summary, pressure controllers achieve precise regulation and management of minute flow rates by accurately measuring and controlling fluid pressure, thereby effectively enhancing manufacturing process capabilities and product quality in the semiconductor, hydrogen energy, and high-end manufacturing sectors.