ACU20FP Dimensional Drawing
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ACU20FP
ACU20FP
In the manufacturing process of thin film materials, traditional liquid delivery methods have the problem of limited solubility of solid precursors, resulting in insufficient material delivery and affecting production efficiency. The ACU20FP low vapor pressure mass flow controller, specially designed for thin film processes, can precisely control the delivery of solid precursors to the chemical vapor deposition (CVD) reactor.
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Product Description
- Product Description
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I. Product Overview
The ACU20FP utilizes advanced pressure measurement and control technology to precisely control the flow rate of solid precursors, ensuring the stability and consistency of the deposition process, thereby achieving high-quality thin-film materials. Additionally, the ACU20FP offers various control methods and connection interfaces to meet diverse needs.
II. Product Applications
Semiconductors University Laboratories Vacuum Coating Optoelectronic Materials Solar Energy Chemical Manufacturing Aerospace Automotive Industry III. Product Parameters
Measurement Range 10SCCM～250SCCM Control Range Valve Control Range 50:1 Accuracy ±1%F.S Linearity ±0.1%F.S Repeatability ±0.2%F.S Temperature Coefficient ±0.02%F.S/℃ Response Time Flow Controller: <2s Digital Profibus Protocol Analog 0～5V、4-20mA、1～5V Power Supply ±15VDC，24VDC Operating Temperature 0～50℃ Operating Pressure Pressure Drop: <0.01Mpa Maximum Pressure Resistance 3MPa/10MPa Electrical Connection DB9 Port Leak Rate 1×10-9Pa m3/S Temperature Coefficient ±0.025%F.S/℃ Base Material Stainless Steel Sealing Material Viton, Chloroprene Rubber, Nitrile Rubber Connector φ3，φ6，1/8"，1/4" IV. Product Dimensions
V. Optional Matching Control Software (Additional Charges Apply)
Mass Flow Control System V5.0
Keyword:
Semiconductor and Microelectronics Manufacturing
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